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Spintrac Systems Announces Four New Cost-Saving Coater and Developer System Configurations

SANTA CLARA, CA — (Marketwired) — 06/29/15 — Spintrac Systems, Inc., a Silicon Valley based manufacturer of photoresist spin coater and developer systems, today announced the release of four new Tractrix system configurations. The new configurations feature improved process capability with a reduced cost of ownership. The average number of service calls for a Tractrix system has been less than one for the life of the machine.

With reliability and efficiency in mind, the systems are designed to exceed users– expectations.

“Our mission was to provide a superior, efficient and flexible system,” explained Alan Kukas, president of Spintrac Systems. “The new configurations have been shipped, installed and are successfully running in production. Our clients are delighted with their improved processing capability, reduced cost of ownership, and excellent reliability. We achieved our goal, to exceed expectations. Now it–s time to share the news with the rest of the industry.”

Spintrac–s new configurations are optimized for manufacturing laser components, flat panel displays, process chemistries, and to support established providers of precision photolithography steppers

The versatile Tractrix tools can be equipped to handle InP, GaAs, and silicon wafers (up to 300mm) plus 6″ x 6″ glass or even rectangular substrates. Custom features include:

Parallel Bake option

Software-assisted size change

Laser mapping of wafer cassettes

Integrated chemical and pump storage

Spintrac–s new technology is an adaptation of the production-proven, reliable Tractrix system.

Spintrac will be attending SEMICON West 2015, July 14-16 at Moscone Center in San Francisco. Contact Spintrac to schedule a meeting and learn more about the new configurations: 408-980-1155,

Spintrac Systems, Inc. (formerly known as SITE Services, Inc.) has over 30 years of experience in supporting the manufacture of semiconductor and other related devices that utilizes the photolithography process. Spintrac Systems now designs and manufactures their own line of photolithography coat, bake and develop systems that are suited for R&D centers and production fabs. Initial equipment designs were targeted to handle silicon wafers and now they extend into many specialized substrates including compound semiconductors (InP, GaAs), sapphire, glass and ceramic varying in size from 2″ to 320mm x 380mm plates to 450mm wafers. All of the company–s products utilize modern technology with a focus on delivering precise, repeatable process results while maintaining a high level of reliability and serviceability. .

Company Contact:
Alan Kukas
408.980.1155

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