The Institute for Microelectronics and Microsystems (CNR-IMM/1/) in Catania, Italy is using a SI PEALD LL tool with an 8-inch wafer configuration. The research Institute belongs to the Physics and Matter Technologies Department (DSFTM) of the National Reseach Council of Italy (CNR), and has its headquarters in Catania. The integration of novel high-k gate dielectrics and passivating layers on devices based on Gallium Nitride and other wide band gap semiconductors is investigated using SENTECH PE
SENTECH has organized a seminar on Plasma Process Technology on March 5th 2015, held at SENTECH Instruments in Berlin Adlershof. The Seminar was the 10th plasma seminar and attracted more than 50 specialists from industry, research institutions and universities. Aim of the seminar was to bring various user groups from industry and R&D together for networking. Taking the opportunity SENTECH introduced the new ALD Real Time Monitor.
The new ALD Real Time Monitor was presented at the NRW Nano-Conference (1st-2nd of December 2014). This important conference welcomed its guests to participate the dialogue about opportunities and challenges of nanotechnology.
With more than 6000 visitors the SEMICON Europa 2014 was the ideal place to introduce SENTECH’s latest development on the field of atomic layer deposition (ALD) – the new ALD Real Time Monitor.
CAMBRIDGE, MA — (Marketwire) — 02/28/12 — , the world leader in (ALD) science and equipment, has completed delivery of its 300th system to the in Shanxi, China. Marking as a milestone for the company, Cambridge NanoTech-s ALD systems have become an important strategic solution for researchers and manufacturers that require digital control for a variety of materials such as oxides, nitrides, sulfides, and metals.The Institute of Coal Chemistry is a high-tech research and development instit
