CNR-IMM Italy uses SI PEALD LL for new high-k materials
The Institute for Microelectronics and Microsystems (CNR-IMM/1/) in Catania, Italy is using a SI PEALD LL tool with an 8-inch wafer configuration. The research Institute belongs to the Physics and Matter Technologies Department (DSFTM) of the National Reseach Council of Italy (CNR), and has its headquarters in Catania. The integration of novel high-k gate dielectrics and passivating layers on devices based on Gallium Nitride and other wide band gap semiconductors is investigated using SENTECH PE