Rigaku Innovative Technologies (RIT) Presents New Line of EUVL Product Solutions at 2013 International Symposium on EUVL
AUBURN HILLS, MI — (Marketwired) — 10/21/13 — Rigaku Innovative Technologies (RIT), a leading global supplier of multilayer optic technology for EUV lithography (EUVL), has unveiled its new line of EUVL solutions to support high volume EUV Lithography in conjunction with successful appearances at the 2013 International Symposium on Extreme Ultraviolet Lithography in Toyama, Japan.During the symposium, RIT presented its advanced IR Rejection Collector (IRRC) technology for high-power EUV sour