SENTECH is a project partner of the project "Research on highly flexible optical precision layers on polymer surfaces (FlexCoPlas)", which is supported by the funding initiative "Innovative Applications of Plasma Technology" of the German Federal Ministry of Education and Research. Within the three-year project period, an innovative measurement method and measuring device was developed using the technical know-how of SENTECH. Precise control of transmission properties of laye
SENTECH offers an application oriented seminar on the topic “Plasma-Process-Technology” on March 9, 2017 at SENTECH in Berlin Adlershof. We are glad to announce that invited speakers from industry and science will give presentations on plasma etching, PECVD and PEALD and share their experiences with different applications.
The Institute for Microelectronics and Microsystems (CNR-IMM/1/) in Catania, Italy is using a SI PEALD LL tool with an 8-inch wafer configuration. The research Institute belongs to the Physics and Matter Technologies Department (DSFTM) of the National Reseach Council of Italy (CNR), and has its headquarters in Catania. The integration of novel high-k gate dielectrics and passivating layers on devices based on Gallium Nitride and other wide band gap semiconductors is investigated using SENTECH PE
SENTECH proudly presents the new spectroscopic ellipsometer SENresearch 4.0.
The SENresearch 4.0 is an innovative ellipsometry solution which features widest spectral ranges and highest spectral resolution. The Step Scan Analyser (SSA) principle is applied for ellipsometric measurement, i.e. there are no moving optical parts during data acquisition for best measurement results.
